The Cr/Gd magnetic multilayers of the following configuration were deposited on 20 nm thick Mo buffer using Molecular Beam Epitaxy UHV technique: substrate/Mo/Cr_x/Gd₃₀ where x=10, 20 and 30 A. Two different types of substrates were used - MgO and Al₂O₃. The growth mechanism and formation of Cr/Gd interface were investigated in situ by RHEED. Bilayer (Cr+Gd) thickness and interface roughness were determined from X-Ray reflectometry curves by fitting procedure using Simulreflec software based on Parrat algorithm. The temperature and field magnetization dependencies M(H) and M(T) were measured by SQUID and high sensitivity VSM magnetometer at the temperature range from 5K to 250K.

It was shown that the roughness of the Cr/Gd interface strongly depends on the type of the substrate -the samples grown on the Al₂O₃ substrate were smoother then those grown on MgO. A strong influence of substrate temperature on Cr/Gd interface formation was observed - samples grown at room temperature were much smoother then samples grown at 250 C. The strong in-plane anisotropy has been observed from the hysteresis loops analysis. Furthermore, the magnitude of coercivity field was found to increase with increasing of Cr layer thickness. Curie temperatute dependence on Cr layer thickness was also investigated.