Promising high quality short period Fe/Fe-N multilayers deposited by the sputtering

Wojciech Szuszkiewicz 1Krzysztof Fronc 1Piotr Dłużewski 1Roman Minikayev 1Wojciech Paszkowicz 1Bernard Hennion 2Frederic Ott 2Gregory Chaboussant 2

1. Polish Academy of Sciences, Institute of Physics, al. Lotników 32/46, Warszawa 02-668, Poland
2. Laboratoire Leon Brillouin, CEA-CNRS, CE Saclay (LLB), Gif-sur-Yvette 91191, France

Abstract

The properties of Fe/Fe-N based structures are a topic of intensive studies during at least ten last years. Up to now, the successful Fe/Fe-N multilayer growth has been reported by a few groups only and was mostly limited to the long-period structures. Moreover, available results suggested wide and rough Fe/Fe-N interfaces. Similar multilayers were recently deposited by the sputtering on GaAs substrates at the Institute of Physics of the Polish Academy of Sciences. The goal of the present paper was to demonstrate the successful growth of the short-period Fe/Fe-N multilayer, consisting of 22 repetitions of 40 Å thick Fe layer followed by 12 Å thick Fe-N layer. The high quality of the investigated structure was proved by X-ray reflectometry, neutron scattering, and transmission electron microscopy. In particular, our results demonstrated the presence of narrow (sharp) Fe/Fe-N interfaces, which are important for possible new applications.

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Presentation: oral at E-MRS Fall Meeting 2005, Symposium F, by Wojciech Szuszkiewicz
See On-line Journal of E-MRS Fall Meeting 2005

Submitted: 2005-05-30 18:29
Revised:   2009-06-07 00:44
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