- Adam Łaszcz

e-mail:
fax: +48-22-8470631
web:
interest(s):

Affiliation:


Institute of Electron Technology

address: al. Lotników 32/46, Warszawa, 02-668, Poland
phone: (4822)5487792
fax: (4822)8470631
web: http://www.neti.ite.waw.pl

Participant:


E-MRS Fall Meeting 2003

began: 2003-09-15
ended: 2003-09-11
Presented:

E-MRS Fall Meeting 2003

Transmission Electron Microscopy of Iridium Silicide Contacts for Advanced MOSFET Structures with Schottky Source and Drain

Participant:


E-MRS Fall Meeting 2006

began: 2006-09-04
ended: 2006-09-08
Presented:

E-MRS Fall Meeting 2006

TEM study of iridium silicide contact layers for Low Schottky Barrier MOSFETs

Publications:


  1. TEM study of iridium silicide contact layers for Low Schottky Barrier MOSFETs
  2. Transmission Electron Microscopy of Iridium Silicide Contacts for Advanced MOSFET Structures with Schottky Source and Drain



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