ALD of TiO2 based photocatalysts

Mikko Ritala ,  Viljami Pore ,  Mikko Heikkilä ,  Marianna Kemell ,  Eero Santala ,  Markku Leskela 

Department of Chemistry, University of Helsinki, A. I. Virtasen aukio 1, Helsinki FIN-00014, Finland

Abstract

Titanium dioxide is the most widely studied and used photocatalyst. TiO2 based photocatalysts are used for air and water purification, and as self-cleaning and sterilizing coatings. A lot of methods exist for preparation of TiO2 photocatalysts in the form of both powders and coatings. Among these methods atomic layer deposition (ALD) can distinguish itself mostly based on its excellent conformality and possibility to tailor the composition at atomic layer level. This paper summarises our work on ALD of TiO2 based photocatalysts. Areas to be covered include comparison of various TiO2 ALD processes available, doping and modification of ALD-TiO2 in an effort to make it active also under visible wavelengths, preparation of three-dimensional photocatalyst structures exploiting the unique features of ALD, and enhancement of the photocatalytic process by an external bias voltage (photoelectrocatalysis).

 

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Presentation: Invited at E-MRS Fall Meeting 2007, Symposium C, by Mikko Ritala
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 11:40
Revised:   2009-06-07 00:44