Markku Leskela

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Affiliation:


Department of Chemistry, University of Helsinki

address: A. I. Virtasen aukio 1, Helsinki, FIN-00014, Finland
phone: +358-9-19150207
fax: +358-9-19150198
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Participant:


E-MRS Fall Meeting 2003

began: 2003-09-15
ended: 2003-09-11
Presented:

E-MRS Fall Meeting 2003

Atomic Layer Deposition of Oxide Dielectric Films for Microelectronics

Participant:


E-MRS Fall Meeting 2007

began: 2007-09-17
ended: 2007-11-30
Presented:

Publications:


  1. ALD metal fluoride thin films for UV optics
  2. ALD of TiO2 based photocatalysts
  3. ALD of ZrO2 Thin Films Exploiting Novel Mixed Alkylamido-Cyclopentadienyl Precursors
  4. Atomic Layer Deposition of Oxide Dielectric Films for Microelectronics
  5. Conduction mechanisms in nanolaminates and mixture films grown by atomic layer deposition
  6. Growth of CdS - PbS nanotructured double films on silicon substrate by SILAR techniques



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