Andrian V. Kuchuk

e-mail:
fax:
web:
interest(s):

Affiliation:


V.E.Lashkarev Institute of Semiconductor Physics of NAS of Ukraine

address: 45 Nauky Prospekt, Kyiv, 03028, Ukraine
phone:
fax:
web: http://www.isp.kiev.ua

Affiliation:


Institute of Electron Technology

address: al. Lotników 32/46, Warszawa, 02-668, Poland
phone: (4822)5487792
fax: (4822)8470631
web: http://www.neti.ite.waw.pl

Participant:


E-MRS Fall Meeting 2004

began: 2004-09-06
ended: 2004-09-10
Presented:

E-MRS Fall Meeting 2004

Structural analysis of reactively sputtered W-Ti-N thin films

E-MRS Fall Meeting 2004

Diffusion barrier properties of reactively sputtered W-Ti-N thin films

Publications:


  1. Diffusion barrier properties of reactively sputtered W-Ti-N thin films
  2. Structural analysis of reactively sputtered W-Ti-N thin films
  3. Study of Long-Term Stability of Ohmic Contacts to GaN
  4. TaSiN, TiSiN and TiWN diffusion barriers for metallization systems to GaN
  5. Thermally stable Ru-Si-O gate electrode for AlGaN/GaN HEMT



Google
 
Web science24.com
© 1998-2018 pielaszek research, all rights reserved Powered by the Conference Engine