dr Kaupo Kukli

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Affiliation:


Department of Physics, University of Tartu

address: Tähe Street, Tartu, 51010, Estonia
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Participant:


E-MRS Fall Meeting 2007

began: 2007-09-17
ended: 2007-11-30
Presented:

E-MRS Fall Meeting 2007

Electrical properties of high-k materials prepared by ALD

Publications:


  1. ALD of ZrO2 Thin Films Exploiting Novel Mixed Alkylamido-Cyclopentadienyl Precursors
  2. Atomic Layer deposition of iron oxide nanotubes
  3. Atomic Layer Deposition of Oxide Dielectric Films for Microelectronics
  4. Conduction mechanisms in nanolaminates and mixture films grown by atomic layer deposition
  5. Electrical properties of high-k materials prepared by ALD



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