Spatial Profile of Neutral Free Radical Beam Produced by the Method of Photo-Deionization of Negative Ion Beams
|Keiji Hayashi 1, Hiroshi Konno , Takuo Kanayama , Takashi Oseki|
1. Advanced Materials Science R&D Center, Kanazawa Institute of Technology (AMS, KIT), 3-1, Yatsukaho, Matto, Ishikawa, Kanazawa 924-0838, Japan
In order to further develop integrated quantum-functional devices it has become indispensable in recent years to ingeniously utilize selective surface reactions of neutral free radicals for the device processing. The problem encountered in the experimental study of a chemical reaction between a neutral free radical and a well-characterized material surface is how to sufficiently supply a steady-flux refined beam of neutral free radicals (RBNR), that is to say, purified beam of momentum-controlled neutral free radicals onto the surface. In order to overcome the difficulty we have proposed several experimental production approaches1), one of which is the method of photo-deionization of negative ion beams (PDINIB). When we apply RBNR to thin film growth, a steady-flux beam obtained using a CW laser is more useful than a pulsed beam. However, the power of available CW lasers is generally much weaker than the peak power of pulsed lasers. Thus, development of a multiple-pass photo-deionizer (MPDI) to enhance the photo-neutralization efficiency has been a key point to realize a practical steady-flux PDINIB apparatus. The rate of neutral free radical production by our trial PDINIB apparatus is estimated in Ref.2 based on measurement of decrease in the negative-ion beam current (DNIC).
Presentation: oral at E-MRS Fall Meeting 2003, Symposium C, by Keiji Hayashi
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-06-03 17:32 Revised: 2009-06-08 12:55