Predictive Use of Ab Initio MO Methods In PDECB-Based Approach to Low-Temperature Epitaxy of Stoichiometric Group-III Nitrides
|Keiji Hayashi 1, Takuo Kanayama , Noriyoshi Omote|
1. Advanced Materials Science R&D Center, Kanazawa Institute of Technology (AMS, KIT), 3-1, Yatsukaho, Matto, Ishikawa, Kanazawa 924-0838, Japan
In order to further develop integrated quantum functional devices and nano-electromechanical systems it has become indispensable in recent years to ingeniously utilize selective surface reactions of labile neutral chemical species such as free radicals and organometallic compounds for the device processing. The problem encountered in the experimental study of a chemical reaction between a neutral free radical and a well-characterized material surface is how to sufficiently supply only the desired free radical species onto the surface. We have proposed several experimental methods to produce a steady-flux purified beam of neutral free radicals1). One of them is the method of photo-dissociation of energetic compound beams (PDECB) where a beam of desired neutral free radical species is efficiently produced from a molecular beam of a purified unimolecular metastable dye by wavelength-selective photolysis using a near-UV CW laser2).
Presentation: poster at E-MRS Fall Meeting 2003, Symposium C, by Keiji Hayashi
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-06-03 17:49 Revised: 2009-06-08 12:55