dr Iwona A. Kowalik

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interest(s):

Affiliation:


Polish Academy of Sciences, Institute of Physics

address: al. Lotników 32/46, Warszawa, 02-668, Poland
phone: +48-22-8436601
fax: +48-22-8430926
web: http://www.ifpan.edu.pl

Participant:


E-MRS Fall Meeting 2004

began: 2004-09-06
ended: 2004-09-10
Presented:

E-MRS Fall Meeting 2004

Interaction of Mn and Ti atoms with GaN surface - a resonant photoemission study

Participant:


Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth

began: 2007-05-20
ended: 2007-05-24
Presented:

Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth

Effect of annealing on electrical properties of low temperature ZnO films

Participant:


E-MRS Fall Meeting 2007

began: 2007-09-17
ended: 2007-11-30
Presented:

E-MRS Fall Meeting 2007

ZnO thin films for organic/inorganic heterojunctions

Participant:


IX Krajowe Sympozjum Użytkowników Promieniowania Synchrotronowego

began: 2011-09-26
ended: 2011-09-27
Presented:

IX Krajowe Sympozjum Użytkowników Promieniowania Synchrotronowego

Magnetyczna spektroskopia i spektro-mikroskopia na materiałach spintronicznych

Publications:


  1. Differential Reflectivity and Photoemission study of ZnTe and CdTe(110) surface
  2. Effect of annealing on electrical properties of low temperature ZnO films
  3. Gallium nitride surface formation and modification by Mn deposition - photoemission studies with use of synchrotron radiation
  4. Gd atoms on Si (111) surface – AFM and photoemission study
  5. Interaction of Mn and Ti atoms with GaN surface - a resonant photoemission study
  6. Magnetyczna spektroskopia i spektro-mikroskopia na materiałach spintronicznych
  7. Mn 3d electrons in the valence band of Mn/Ge0.9Mn0.1Te- a resonant photoemission study
  8. Mn doped ZnTe (110) (1x1) surface in Resonant Photoemission study
  9. GaN(0001) surface Fe atoms doped

  10. Wide band-gap II-VI semiconductors for optoelectronic applications
  11. ZnO thin films for organic/inorganic heterojunctions



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