Michał Ćwil

e-mail:
fax:
web: http://www.if.pw.edu.pl/~cwil
interest(s):

Affiliation:


Industrial Institute of Electronics

address: Dluga, Warszawa, 00-241, Poland
phone: 8312160
fax: 8315221
web:

Affiliation:


Warsaw University of Technology, Faculty of Physics

address: Koszykowa 75, Warszawa, 00-662, Poland
phone: +48 22 6296124
fax: +48 22 6282171
web: http://www.if.pw.edu.pl

Participant:


E-MRS Fall Meeting 2004

began: 2004-09-06
ended: 2004-09-10
Presented:

E-MRS Fall Meeting 2004

Ultra-low energy SIMS depth profile analysis of MOVPE grown InAlGaAs/AlGaAs/GaAs nanostructures

Participant:


E-MRS Fall Meeting 2005

began: 2005-09-05
ended: 2005-09-09
Presented:

E-MRS Fall Meeting 2005

Si-oxide and Si-oxynitride interfaces analysed by ultra-low energy SIMS


Participant:


E-MRS Fall Meeting 2006

began: 2006-09-04
ended: 2006-09-08
Presented:

E-MRS Fall Meeting 2006

SIMS depth profiling of thin nitride- and carbide-based films for hard coating

Publications:


  1. Comparative study of superthin TiNx layer by XPS and low energy SIMS
  2. Si-oxide and Si-oxynitride interfaces analysed by ultra-low energy SIMS

  3. SIMS depth profiling of thin nitride- and carbide-based films for hard coating



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