Search for content and authors
 

- Myoung-Gyun Ko

e-mail:
phone: +82-2-22200386
fax: +82-2-22982850
web:
interest(s):

Affiliation:


Hanyang University

address: 14-509, Heangdang-Dong, Seong-dong-Gu, Seoul, 133-791, Korea, South
phone: +82-2-22200386
fax: +82-2-22982850
web: http://www.thinfilmlab.com

Participant:


E-MRS Fall Meeting 2007

began: 2007-09-17
ended: 2007-11-30
Presented:

E-MRS Fall Meeting 2007

Characterization of ruthenium titanium nitride thin films deposited by rf-direct plasma atomic layer deposition

E-MRS Fall Meeting 2007

A study for interface of ruthenium deposited by rf-direct plasma enhanced atomic layer deposition

Publications:


  1. A study for interface of ruthenium deposited by rf-direct plasma enhanced atomic layer deposition
  2. Characterization of ruthenium titanium nitride thin films deposited by rf-direct plasma atomic layer deposition
  3. Plasma enhanced atomic layer deposition of titanium oxide passivation layers on polymer substrates



Google
 
Web science24.com
© 1998-2024 pielaszek research, all rights reserved Powered by the Conference Engine