Transport properties on nitrogen at high pressure and temperature: viscosity – MD study.

Pawel Strak 1,2Stanisław Krukowski 2

1. Warsaw University of Technology, Faculty of Physics, Koszykowa 75, Warszawa 00-662, Poland
2. Polish Academy of Sciences, Institute of High Pressure Physics (UNIPRESS), Sokolowska 29/37, Warszawa 01-142, Poland

Abstract

At present several methods are used to obtain GaN substrates for optoelectronic. The high nitrogen pressure solution growth (HNPSG) is characterized by its ability to provide very high crystallographic quality crystal substrates. The typical dislocation density is of order of 102 cm-2, which fulfills industrial standards.

A considerable drawback of the method is the limited size of the GaN crystals. The routinely obtained GaN crystal are about 1 cm in linear dimensions and about 100-00 micron in thickness. Therefore further studies are necessary to develop the method to increase the size and also the efficiency of the HNPSG method.

The investigation of the method requires reliable knowledge of the equilibrium and transport properties of nitrogen at very high pressure and temperature. Recent works reported on ab initio and MD studies of nitrogen properties such as nitrogen intermolecular potential and equation of state [1,2]. In this paper we report on the preliminary results on nitrogen viscosity at the pressures up to 20 kbar and the temperatures up to 2000K.

[1] Krukowski S, Strak P, Journal-of-Chemical-Physics. 7 April 2006; 124(13): 134501-1-9

[2] Strak P, Krukowski S, Journal-of-Chemical-Physics. - accepted (2007)

 

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Presentation: Poster at Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth, by Pawel Strak
See On-line Journal of Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth

Submitted: 2007-02-16 14:51
Revised:   2009-06-07 00:44