Cu(I) complexes with perfluorinated carboxylates as potential CVD precursors

Iwona Szymańska ,  Edward Szłyk ,  Piotr Piszczek ,  Lilianna Dobrzańska 

Nicolaus Copernicus University, Faculty of Chemistry (WChUMk), Gagarina 7, Toruń 87-100, Poland

Abstract

Previous studies revealed that Au(I) and Ag(I) complexes with perfluorinated carboxylates and tertiary phosphines presented sufficient volatility for chemical vapour deposition (CVD), hence the purpose of this work was to prepare volatile precursors for CVD of copper metal or copper oxide thin films. Cu(I) complexes with trimethyl phosphite and aliphatic perfluorinated carboxylates of the type [Cu2{P(OMe)3}2(μ-RCOO)2] where R = CF3, C2F5, C3F7, C6F13, C7F15, C8F17, C9F19 have been prepared as viscous liquids. The EI mass spectrometry, temperature-variable IR spectroscopy and thermal studies were undertaken to determine the type of species appeared in the gas phase and the thermal decomposition reaction mechanism. The thermal analysis data suggest, that compounds studied can be used in CVD of copper oxide films, however the decomposition product can be modify by conditions applied for the deposition technique. The MS and temperature-variable IR data analysis pointed to [Cu2{P(OMe)3}2(μ-C6F13COO)2] as the most suitable potential liquid CVD precursor from the complexes studied. CVD experiments were performed in the low-pressure horizontal CVD reactor using argon as the carrier gas. The obtained films were investigated by XPS. More than two forms of copper were existed on the sample surface and unfortunately some impurities of carbon, fluorine and phosphorous.

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Presentation: poster at E-MRS Fall Meeting 2003, Symposium A, by Iwona Szymańska
See On-line Journal of E-MRS Fall Meeting 2003

Submitted: 2003-05-27 14:07
Revised:   2009-06-08 12:55
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