Influence of the substrate on the structural properties of sputter-deposited ZnO films
|Hyoun Woo Kim 1, Nam Ho Kim|
1. Inha University, School of Materials science and engineering, 253 Yong Hyun Dong, Nam Ku, Incheon 402-751, Korea, South
We have demonstrated the growth of ZnO thin films with c-axis (002) orientation at room temperature on Si(100), SiO2, and amorphous ZnO substrates by the radio frequency (RF) magnetron sputtering method. We investigated the structural properties of ZnO thin films deposited on various substrates with varying the RF power. X-ray diffraction analysis revealed that increasing the RF power helped to decrease the compression stress and to increase the grain size, regardless of the substrate material. Scanning electron microscopy indicated that the structural morphology of the ZnO films were not dependent on the substrate material.
Presentation: poster at E-MRS Fall Meeting 2003, Symposium A, by Hyoun Woo Kim
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-05-14 10:44 Revised: 2009-06-08 12:55
|© 1998-2018 pielaszek research, all rights reserved||Powered by the Conference Engine|