Influence of the substrate on the structural properties of sputter-deposited ZnO films

Hyoun Woo Kim 1Nam Ho Kim 

1. Inha University, School of Materials science and engineering, 253 Yong Hyun Dong, Nam Ku, Incheon 402-751, Korea, South


We have demonstrated the growth of ZnO thin films with c-axis (002) orientation at room temperature on Si(100), SiO2, and amorphous ZnO substrates by the radio frequency (RF) magnetron sputtering method. We investigated the structural properties of ZnO thin films deposited on various substrates with varying the RF power. X-ray diffraction analysis revealed that increasing the RF power helped to decrease the compression stress and to increase the grain size, regardless of the substrate material. Scanning electron microscopy indicated that the structural morphology of the ZnO films were not dependent on the substrate material.


Related papers
  1. Fabrication of Metal-Shelled Coaxial Nanowires and Annealing-Induced Formation of Metal Nanoparticles for Catalytic Applications
  2. Fabrication and Raman Studies of Core-Shell Heteronanowires
  3. Crystaline Bi2O3 nanofibers fabricated on sapphire substrates using a trimethylbismuth and oxygen mixture
  4. Growth and characterization of doped Ga2O3 and SnO2 nanofibers using GaN and Sn powder mixtures
  5. SnO2/SiOx core-shell nanoneedles

Presentation: poster at E-MRS Fall Meeting 2003, Symposium A, by Hyoun Woo Kim
See On-line Journal of E-MRS Fall Meeting 2003

Submitted: 2003-05-14 10:44
Revised:   2009-06-08 12:55