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Application of Ultrasound in the Wafer Fabrication: 1) Development of an Ozone Detector and 2) Degasification of Process Water

Jörg Hofmann ,  Ute Freier ,  Mike Wecks 

Institut für Nichtklassische Chemie (INC), Permoserstraße 15, Leipzig 04318, Germany

Abstract

Ozone is widely used in the etching technology of wafers and other microelectronic components and in water treatment, too. For both applications a ruggedly designed ozone detector owning high metering precision is necessary. In the ozone detector ultrasound is used to degrade the dissolved ozone to enable the calibration of the zero point of the measuring equipment. The degassing and deozonization are key steps during the water circulating process in the fabrication of wafers and microelectronic components. Ultrasound enables a high effective degassing of process and waste water.

Ozone detector


The ozone detector can be widely used in water analytic. The measurement of ozone concentration in water is a part of process control system for example in microelectronic industry and in ozoni­zation of drinking and waste water. Water is taken in a bypass of a technical circulating water system continuously. In the detector the UV absorption of ozone at 254 nm is measured to determine the concentration in a light pipe directly. If the water contains organic compounds the measuring signal increases because of the organics absorb in the same wave length range. By this reason a correction of the signal is necessary. To get the "zero"-value the ozone is degraded by ultrasound periodically. This measured signal is used to make a correction of the ozone concentration.


The first laboratory test equip­ment was build up with a traditional 24 kHz ultra­sonic system and an ozone detector.


Afterwards the analytical equip­ment has been opti­mized (measuring range, frequency of ultrasound, response time in the ultrasonic cell, influence of water parameters and organic compounds dissolved in the water, robustness etc.).


For a mobile application a scale-down of the ultrasonic system and the ozone measuring cell has been done.

Degasification of process and waste water

The degassing process is applied in treatment of process water of wafer fabrication, in the air sparkling of contaminated ground water, in the biogas plants etc. In the ozone elimination process of the wafer fabrication the ultrasound has to be applied at high flow rates of water and short contact times. To increase the efficiency the ultrasound parameters (power, frequency etc.), process parameters and the reactor geometry were optimised.
 

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Presentation: Poster at COST action D32 Mid term evaluation meeting, by Jörg Hofmann
See On-line Journal of COST action D32 Mid term evaluation meeting

Submitted: 2006-03-24 13:34
Revised:   2009-06-07 00:44