Nanofabrication - direct write and replication patterning technologies in EUMINAfab

Frank Dirne 1Hans Loeschner 2Manfred Kohl 3Falco Delft 1Elmar Platzgummer 2

1. Philips Research Laboratories, Prof. Holstlaan 4 WAG 12, Eindhoven 5656AA, Netherlands
2. IMS Nanofabrication AG, Schreyrgasse 3, Wien A-1020, Austria
3. Karlsruhe Institute of Technology (KIT), Karlsruhe 76131, Germany

Abstract

Nanodevice fabrication requires structuring techniques that, in an economically attractive way, can generate high-resolution features. Direct writing techniques, like electron- and ion-beam lithography, are slow and require very expensive machines.  Hence, they are mostly used for nanodevice development. These techniques need scaling up by introducing the concept of massive parallel beams as is the case for CHARPAN (Charged Particle Nanopatterning) using 43-thousand programmable ion beams of 12.5nm beam size.


In this presentation, the EUMINAfab nano-lithography competences on electron-beam lithography, ion multi- beam lithography and imprint lithography are highlighted. Structuring of 15 nm wide Ag antennas is shown as an example of electron-beam lithography cobined with either lift-off or dry etching technology. Further, SCIL (Substrate Conformal Imprint Lithography) is presented as a commercially successful case of large-area replication technology in the field of fabrication of gratings for VCSELs. Finally, the ultra-high resolution capabilities of CHARPAN are demonstrated as direct write tool (12.5 nm half pitch lines and dot arrays) and in combination with SCIL, achieving 20nm 1:1 lines&spaces.

 

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Presentation: Oral at Nanotechnologia PL, by Frank Dirne
See On-line Journal of Nanotechnologia PL

Submitted: 2010-08-26 15:10
Revised:   2010-09-07 17:47