Advances in nanotechnologies need non-destructive characterization methods. To reach this, electron emission measurements, when energy to escape an electron from a tested object is not enough to destroy its molecular/atomic couples, are employed as such energies have values ~ 0.1-1 eV for non-destructive characterization. The excited electron has a mean free path (L) ~ 100-10 nm¹, correspondingly within the analysed emitter. These values of L fit sizes of nanostructures. This is a key point to apply electron emission for nanomaterials characterization. The paper is targeted to consider a prethreshold photo- and exo- electron emissions and their capabilities in respect with nanostructures characterization.

The report demonstrates that photo and exo emission measurements are capable to supply sensitive, accurate, and non-contact technique for the needs of nanotechnologies. The  techniques are directed to measure the electron work function (to characterise surface potential), distribution of the electron states density;  energy gap and charge relaxation; concentration of the point type imperfections, their annealing and migration (EE).

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