Carbon has a very interesting characteristic: high hardness and wear resistance, low friction coefficient and good electrical properties. The combination of these properties makes carbon films a very attractive material for use in many fields of the industry, especially in detectors and other electronic devices. In this work carbon coatings were deposited using RF PACVD and MW/RF PACVD methods. Descriptions of applied plasmo-chemical technologies and surface preparation methodology are presented. Deposited layers were investigated on SEM and AFM. Mechanical properties such as nanohardness, Young’s modulus adhesion and friction coefficient were measured with use of the nanointendation techniques. Thickness of manufactured layers was determined using elipsometric and profilometer techniques. Electrical parameters was examined. The analysis of the influence of the main process parameters on the thickness of obtained layers was made. It was noticed that due to microwave plasma application very thick, about 20 micrometers thick layers can be deposited. The most interesting investigation results were obtained during the blocking potential tests conducted in different temperatures. Acquired results suggests that carbon coatings deposited in dual mode microwave and radio frequency plasma are a very perspective material especially  for high power devices.

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