Search for content and authors
 

Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry

James N. Hilfiker 1Neha Singh 1Diana Convey 2Steven M. Smith 2Harland G. Tompkins 3

1. J.A. Woollam Co., Inc., 645 M Street, Suite 102, Lincoln 68508, United States
2. Motorola, 2100 E. Elliot Road, Tempe, AZ 85284, United States
3. Consultant, 1125 W. Mission Drive, Chandler, AZ 85224, United States

Abstract

Spectroscopic Ellipsometry (SE) is routinely used to measure thickness and optical constants of dielectric and semiconductor films. However, it is difficult to insure unique results for thin absorbing films, such as metals. SE methods to enable simultaneous determination of metal layer thickness and optical constants include multiple sample analysis, interference enhancement, optical constant parameterization, and simultaneous analysis of SE and intensity-based optical measurements. Methods are tested on a series of Chromium thin films prepared with multiple thicknesses and multiple substrate types to allow direct comparison between methods.

 

Legal notice
  • Legal notice:
 

Presentation: Invited at E-MRS Fall Meeting 2007, Symposium H, by James N. Hilfiker
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 23:06
Revised:   2009-06-07 00:44