Physics of growth of thin films deposited by laser ablation
Military University of Technology, Institute of Optoelectronic (MUT), Wołoska, Warszawa 02-507, Poland
The pulsed laser deposition (PLD) is the new method for producing multi-component and composite surface layers. The short interaction time (tens of nanoseconds), equivalent to the growth time of deposited layer causes that the PLD method is one of the most perspective methods to produce nano-structure protective coatings. This method is commonly used for deposition of bio-materials, ceramics, and intermetallic layers on metallic alloys, but also can be used to produce thin films on plastics. Thin films can be grown by different type of lasers, from CO2 (λ = 10.6 μm) and Nd:YAG (λ = 1.06 μm) lasers, to the large family of excimer lasers, with shortest commercially available wavelength λ = 157 nm (F2 lasers). According to the laser wavelength used for material ablation and power density on the target, different mechanisms of absorption can dominate. Mechanisms of absorption influence on the ion energy, quantity and sizes of droplets, as well as on the quantity and sizes of large parts of material (debris) deposited on the layers. Influence of different laser parameters and substrate surface quality on the topography and morphology of deposited layers will be illustrated by experimental results obtained for the deposition of Ni3Al and FeAl intermatallics.
Presentation: oral at E-MRS Fall Meeting 2003, Symposium G, by Waldemar Mróz
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-07-03 13:07 Revised: 2009-06-08 12:55