Interdiffusion in Au-Ni Micro- and Nanolayers

Marek Danielewski 2Robert Filipek 2Anna Rakowska 2Krzysztof Sikorski 1

1. Warsaw University of Technology, Faculty of Materials Science and Engineering (InMat), Wołoska 141, Warszawa 02-507, Poland
2. AGH University of Science and Technology (AGH), al. Mickiewicza 30, Kraków 30-059, Poland

Abstract

Interdiffusion in nano- and micro- (500nm - 60μm) Au-Ni layers deposited on different substrates is studied using EDS X-Ray technique. Quantitative X-ray microanalysis was applied and intensities of the characteristic X-ray lines (NiKα, AuMα, SiKα and WMα) were measured up to 30 kV accelerating voltage. Thin layers (500 nm) were analyzed by electron beam perpendicular to their surface. The mean concentration of these elements in each layer were calculated using CAMECA correction program XTFML based on the Pouchou and Pichoir method (PAP) for in-depth analysis of multilayer samples. Bulk layers (up to 60 μm) were investigated on their cross-sections using standard EDS technique with ZAF-4 correction.
Theoretical analysis using the Darken method for multicomponent systems is applied for modelling interdiffusion in the Au-Ni system. Computer simulations, in which intrinsic diffusivities of the Au and Ni are functions of composition, are presented and compared with experimental results.
The aim of this work is: i) to reveal the limits of the Darken method in describing the mass transport in Au-Ni layers, ii) to check an applicability of in depth X-Ray analysis for obtaining the concentration profiles in nanometre thickness multi-layers.

 

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Presentation: oral at E-MRS Fall Meeting 2003, Symposium G, by Marek Danielewski
See On-line Journal of E-MRS Fall Meeting 2003

Submitted: 2003-06-18 18:38
Revised:   2009-06-08 12:55