Reaction Diffusion in Metallic Systems under High Pressure

Ludmila Paritskaya 1,  V. V. Bogdanov 1,  Yury S. Kaganovskii 2,  Witold Łojkowski 3,  Adam Presz 3

1. Department of Crystal Physics, Kharkov State University, Svoboda Squ.4, Kharkov, Ukraine
2. Bar-Ilan University, Ramat-Gan 52900, Israel
3. Polish Academy of Sciences, High Pressure Research Center (UNIPRESS), Sokolowska 29/37, Warszawa 01-142, Poland

Abstract


Different kinetic regimes of phase formation during reaction diffusion
have been analised. The method for determination both interdiffusion
and chemical reaction coefficients from kinetics of thickening of the
phase layer has been found.
The temperature and pressure dependences of phase growth kinetics have
been studied for Cd-Ni and Cu-Zn systems. Arrhenius equations for both
the interdiffusion through growing phase layer and the interfacial
reaction have been obtained for different pressures.
The activation volumes for interdiffusion and chemical reaction have
been evaluated. Diffusion and chemical reaction mechanisms which
explain the pressure dependence of activation energies have been
discussed.

Keywords:intermetallic growth; interfacial reaction; activation
volume; diffusion mechanism

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Presentation: oral at High Pressure School 1999 (3rd), by Ludmila Paritskaya
See On-line Journal of High Pressure School 1999 (3rd)

Submitted: 2003-02-16 17:33
Revised:   2003-10-21 01:37
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