Thin layers of TiN fabricated on metallic titanium and polyurethane by pulsed laser deposition

Bogusław Major Reinhold Ebner 3Tadeusz Wierzchon 1Waldemar Mroz 4Wolfgang Waldhauser 3Roman Major 2Michal J. Wozniak 1

1. Warsaw University of Technology, Faculty of Materials Science and Engineering (InMat), Wołoska 141, Warszawa 02-507, Poland
2. Polish Academy of Sciences, Institute of Metallurgy and Materials Sciences (IMIM PAN), Reymonta 25, Kraków 30-059, Poland
3. Joanneum Research Forschungsgesellschaft mbH, Laser Center Leoben, Steyrergasse, Graz A8010, Austria
4. Military University of Technology, Institute of Optoelectronic (MUT), Wołoska, Warszawa 02-507, Poland

Abstract

Successful use of titanium and its alloys in medicine arises from its promising effects in trauma treatments due to biocompatibility and corrosion resistance. Titanium nitride (TiN) is regarded as a potential biomaterial for blood-contact applications. Titanium nitride thin layers were fabricated by pulsed laser deposition (PLD) using a Nd:YAG laser on two types of biomaterials like: metallic titanium and polyurethane. Formation of the uniform smooth surface was stated in both cases. Application of scanning electron microscopy (SEM) for examination of the cross-section of the materials revealed the form of diffusion layers with continuous transfer from the deposited film to the substrate. Transmission electron microscopy (TEM) examinations performed on the thin foils prepared from the cross-section of the metallic titanium covered with the TiN confirmed the diffusion character of the deposited layer, moreover presenting a fine grained microstructure of the deposited TiN phase. Texture examinations were carried out for the deposited TiN as well as for the titanium substrate. Application of the pseudo-position sensitive detector in texture examination allow to draw the pole figures of residual stresses, while using the X-ray diffraction method for residual stress measurement (sin2Psi) made possible to measure their values which were for the TiN phase in the range -8 to -10 GPa for films fabricated on the metallic titanium substrate and of order of -4 to -5 GPa for the polyurethane substrate. Morphology of the surface of the deposited layers was examined by application of atomic force microscopy (AFM). The results revealed contribution of the deposition parameters as well as the thickness of the layer to the crystallite sizes and vertical diameter.

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Presentation: oral at E-MRS Fall Meeting 2003, Symposium E, by Bogusław Major
See On-line Journal of E-MRS Fall Meeting 2003

Submitted: 2003-05-29 16:37
Revised:   2014-10-06 14:04
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